---

 

题    目：Laser Interference Nanolithography

报 告 人：Zuobin Wang 教授

时    间：2008年 9 月 10日14：30

地    点：东一教116多媒体会议室

主办单位：电子信息工程学院  科技处

内容简介：This report introduces the current developments of laser interference nanolithography (LInL) including the formation of laser interference patterns, system requirements and technological potential of the technology for nanoscale structuring of materials. Laser interference nanolithography is a maskless patterning technology to produce periodic and quasi-periodic nanostructures.

个人简介：Zuobin Wang, BSc, MSc, PhD, received his BSc and MSc degrees in Optoelectronic Engineering from Changchun Institute of Optics and Fine Mechanics (China) in 1982 and 1985, respectively. In 1993, he started his PhD studies at the Centre for Microengineering and Nanotechnology, University of Warwick (UK), and received his PhD in Optical Interferometry in 1997. Since then, he has been a senior research fellow/ project manager at the Manufacturing Engineering Centre of Cardiff University, and involved in a number of EU projects having experience in leading FP6 STREP and IP projects. He is the coordinator of the EU FP6 DELILA project and the principal investigator of the EU FP6 HYDROMEL and IPMMAN projects. He has published more than 50 papers, and is an invited reviewer for Optical Society of America. He was listed in Who’s Who in the World 2000/2006, and in Who’s Who in Science and Engineering 2005-2006.